AGT International offers a niche range of ultra-pure gases used in the semiconductor industry.
Our semiconductor grade gases are used in applications ranging from propylene used in ashable hard mask, methane and carbon monoxide for etch modulation and ethylene used for carbon replenishment in the dielectric layer. We understand the demanding quality requirements of the industry and support our customers with improved tolerances, ship to control and SPC/SQC data.
Our standard products are shown below and in all cases if the specification required is not shown we are able to provide customised specifications.
|Product||Application Area||Semiconductor Purities|
|Carbon Monoxide||Used to modulate the etch rate in the overall etch process step, improving etch selectivity for greater control of etch profiles.||99.99% to 99.999%|
|Carbonyl Sulfide||Used as a sulfur containing precursor in MOCVD||99.9%|
|Ethane||Used in etch modulation as well|
as other processes. Ethane mixtures can
be used to etch compound semiconductors.
|99.995% to 99.9995%|
|Ethylene||Used to replenish carbon in the dielectric layers of the chip which may have been damaged during etch processes.||99.999% to 99.9995%|
|Methane||Used to modulate the etch rate in the etch process step. Methane mixtures are also used to etch compound semiconductors.||99.999% to 99.9999%|
|Propylene||Used to create a low reflectivity|
amorphous carbon layer, known as an
anti-reflective coating or ARC.
|99.95% to 99.995%|